Japan Unveils Revolutionary 10nm Nanoimprint Technology Set to Surpass EUV Constraints
Japan has unveiled a groundbreaking 10nm nanoimprint technology, promising a new approach to semiconductor manufacturing. This innovation could ease the ...
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![[News] Japan Develops 10nm Nanoimprint Technology, with Potential to Tackle EUV Bottleneck – TrendForce](https://earth-news.info/wp-content/uploads/2025/12/329851-news-japan-develops-10nm-nanoimprint-technology-with-potential-to-tackle-euv-bottleneck-trendforce-350x250.jpg)









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